SANTA CLARA, Calif. — Enabling the development of next-generation devices, Applied Materials Inc. here today introduced a new technology that promises to extend the life of traditional gate-oxide ...
The researchers' approach is based on chemical vapor deposition (CVD), a method in which a substrate is put in a vacuum chamber and is exposed to particular chemical vapors. This leads to chemical ...
Fluorinated compounds are used to clean critical instruments like chemical vapor deposition (CVD) chambers in semiconductor and liquid-crystal display (LCD) plants. At display plants, fluorine is both ...
An extensive range of insulating thin films are utilized in modern VLSI circuits providing electrical isolation between conducting regions within a device and as a final capping passivation layer.
Chemical Vapor Deposition (CVD) is a well-known technique in the nanofabrication space known for being able to take a vaporized reactant and deposit it onto a surface to form a thin film. There are ...
Molecular fluorine for CVD chamber cleans. Figure 1: Fluorine generation by electrolysis of HF. Image courtesy Linde Electronics Paul Stockman, head of market development for Linde Electronics, said ...
Extremely thin films of material are used to make everything from potato chip bags to solar cells, and vapor deposition processes are the common techniques used to make thin layers. Vapor deposition ...
TOKYO — Japan's Tokyo Electron Ltd. (TEL) is expanding its efforts in the emerging high-k equipment sector. Starting Oct. 1, TEL will begin receiving orders for its new Trias High-k CVD system.
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